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Home > Products > GaN Epitaxial Wafer > Gan Epitaxial On Si For Power HEMT E-Mode

Gan Epitaxial On Si For Power HEMT E-Mode

GaN-On-Si Epi Wafer For Power HEMT-E Mode
Substrate Diameter: 4-8 inch(111)
Substrate Thickness: 675,1000um
Epi Layer Total Thickness: 2~5.5um

Product Description

Homray Material Technology provides high-performance and high-quality GaN HEMT epitaxial wafers, including GaN-on-Si Epi wafer with Power HEMT E-mode and D-mode. We supply 2 inch,4inch,6inch,8inch GaN-on-Si Epitaxial Wafer with favourable price on the market in China. Silicon thickness is 675um and 1000um. Customized structure and layer parameters are available jin HMT company.

Benefits of using GaN 

  • High power
  • High frequency
  • High power efficiency
  • Low power consumption, energy saving
  • High-temperature robustness
  • Exceed the limitations of current Si power device


Standard Layer Specification For Power HEMT E-Mode


 

Characterization Specification

 
Standard Layer Structure                                        

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M.P: +86-15366208370 ; +86-15366203573
E-mail: kim@homray-material.com;tina@homray-material.com
HMT Silicon Carbide (SiC) Wafer Website: www.sicwafer-hmt.com